Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium
DOI:
https://doi.org/10.46586/tches.v2024.i4.335-354Keywords:
High-order masking, Boolean to arithmetic conversion, Dilithium signature, ML-DSAAbstract
for Dilithium, the post-quantum signature scheme recently standardized by NIST. We improve the masked generation of the masking vector y, based on a fast Booleanto- arithmetic conversion modulo q. We also describe an optimized gadget for the high-order masked rejection sampling, with a complexity independent from the size of the modulus q. We prove the security of our gadgets in the classical ISW t-probing model. Finally, we detail our open-source C implementation of these gadgets integrated into a fully masked Dilithium implementation, and provide an efficiency comparison with previous works.
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Copyright (c) 2024 Jean-Sébastien Coron, François Gérard, Tancrède Lepoint, Matthias Trannoy, Rina Zeitoun
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This work is licensed under a Creative Commons Attribution 4.0 International License.